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Formation of GaN porous structures with improved structural controllability by photoassisted electrochemical etching

机译:通过光辅助电化学刻蚀形成具有改善的结构可控性的GaN多孔结构

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摘要

We aimed to develop a photoassisted electrochemical etching process for the formation of GaN porous structures. Pore linearity and depth controllability were strongly affected by the anode voltage. In addition, the use of light with an energy below the band gap played an important role in controlling the pore diameter. Spectro-electrochemical measurements revealed that the high electric field induced at the GaN/electrolyte interface caused a redshift of the photoabsorption edge. This specific phenomenon can be explained by a theoretical calculation based on the Franz-Keldysh effect. On the basis of the results of our experimental and theoretical analyze, we propose a formation model for GaN porous structures. We also note that the application of the Franz-Keldysh effect is useful in controlling the structural properties of GaN porous structures.
机译:我们旨在开发一种用于形成GaN多孔结构的光辅助电化学蚀刻工艺。孔的线性度和深度可控性受阳极电压的影响很大。另外,使用能量在带隙以下的光在控制孔径方面起着重要作用。光谱电化学测量表明,在GaN /电解质界面处感应的高电场引起光吸收边缘的红移。可以通过基于Franz-Keldysh效应的理论计算来解释这种特定现象。根据我们的实验和理论分析的结果,我们提出了GaN多孔结构的形成模型。我们还注意到,Franz-Keldysh效应的应用对于控制GaN多孔结构的结构特性很有用。

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